Pattern forming method

ABSTRACT

A pattern forming method includes forming a first film on a first layer and a second film on the first film. First and second concave portions are formed in the second film. A third film is formed in the concave portions and a fourth film comprising a polymer is formed on the third film. The fourth film can be processed to phase separate and form a pattern in at least the first opening. The pattern formed in the fourth film can be used in patterning films thereunder. A fifth film can be formed which covers the first concave portion and does not cover the second concave portion. The third film in the second concave portion and the first film under the second concave portion can be processed using the fifth film. The first layer can be patterned using the first, second, or third film as a mask.

CROSS-REFERENCE TO RELATED APPLICATION

This application is based upon and claims the benefit of priority from Japanese Patent Application No. 2015-177714, filed on Sep. 9, 2015, the entire contents of which are incorporated herein by reference.

FIELD

Embodiments described herein relate generally to a pattern forming method.

BACKGROUND

A block copolymer (BCP) is a copolymer containing different repeating unit types disposed along the polymeric chain in groups or blocks by type. Recently, a method of forming a fine pattern using directed self-assembly (DSA) of the BCP has attracted attention. For example, by forming a BCP film on a patterned resist layer including openings, then forming a pattern in the BCP film by phase-separating the BCP film, and then transferring the pattern to another layer, a pattern including features (e.g., holes or openings) smaller than the features (e.g., holes or openings) in the initially patterned resist layer can be formed. In this case, the minimum feature size of the overall patterning method can be determined according to the material properties of the BCP material such as a ratio between total amounts of different polymer blocks and/or molecular weights (e.g., chain length of the block groups) of the different polymer blocks.

There are many cases in which a semiconductor device layer has patterns with different feature sizes. However, in general, if the patterns are formed using BCP in a directed self-assembly process, then feature size is determined by a material properties of the BCP film rather than arbitrarily. For this reason, if multiple patterns with features sizes different from each other are to be formed in one layer, then patterning may require separately performed lithography processes to produce the different final feature sizes. As a result, the number of processes for manufacturing a semiconductor device will be increased, and consequently manufacturing cost of a semiconductor device increases.

DESCRIPTION OF THE DRAWINGS

FIGS. 1A and 1B to FIGS. 7A and 7B illustrate processes in a pattern forming method according to a first embodiment.

FIG. 8 is a schematic diagram illustrating a molecular structure of BCP according to the first embodiment.

FIGS. 9A and 9B are perspective views illustrating examples of a first pattern in a third opening portion according to the first embodiment.

DETAILED DESCRIPTION

In general, according to one embodiment, a pattern forming method includes forming a first film on a first layer (a to-be processed layer). A second film is formed on the first film. A first concave portion having a first width and a second concave portion having a second width greater than the first width is formed in the second film. A third film is formed in the first and second concave portions as conformal film thereon. A fourth film is formed on the third film in the first and second concave portions. The fourth film comprises a polymer having a first portion and a second portion that are phase-separable from each other. The fourth film is processed so as to phase separate such that the first and second portions of the polymer form a first pattern region in the fourth film in which the first portion predominates and a second region in which the second portion predominates. At least a portion of the first pattern region is removed. The third film is patterned in the first concave portion using the second pattern region in the fourth film as a patterning mask. The first film under the first concave portion is patterned using at least one of the second pattern region and the third film as a patterning mask. A fifth film is formed on the first, second, and third films. The fifth film closes an opening above the first concave portion and while leaving at least a portion of an opening above the second concave portion unclosed. The third film in the second concave portion and the first film under the second concave portion is patterned using the fifth film as a patterning mask. The first layer is patterned using at least one of the first, second, and third films as a patterning mask.

Hereinafter, an embodiment will be described with reference to the accompanying drawings.

First Embodiment

FIGS. 1A to 7B are sectional views illustrating a pattern forming method according to a first embodiment. The pattern forming method according to the first embodiment can be used for fabricating, for example, a NAND flash memory.

First, as depicted in FIG. 1A, abase layer 2, a processed layer 3, a first mask layer 4, and a resist layer 5 are sequentially formed on a substrate 1. The first mask layer 4 is an example of a first film. The resist layer 5 is an example of a second film.

As an example, the substrate 1 is a semiconductor substrate comprising silicon or the like. FIG. 1A illustrates X and Y directions which are parallel with a main surface of the substrate 1 and are perpendicular to each other, and the Z direction is perpendicular (orthogonal) to the main surface of the substrate 1. In the present specification, a +Z direction denotes an upward direction (e.g., away from the main surface of the substrate), and the −Z direction denotes a downward direction (e.g., towards the main surface of the substrate). In the present embodiment, the −Z direction may coincide with the gravity direction, or may not coincide with the gravity direction.

As an example, the base layer 2 and the processed layer 3 are various conductive layers, semiconductor layers, insulating layers, or the like. As illustrated in FIG. 1A, the processed layer 3 may be formed on the substrate 1 via the base layer 2, or may be formed directly on the substrate 1 without any intervening base layer 2. In the present embodiment, the processed layer 3 is, for example, a tetraethyl orthosilicate (TEOS) film formed by using a plasma chemical vapor deposition (CVD) method. In the present embodiment, the thickness of the processed layer 3 is 100 nm. The processed layer 3 can be a layer which once patterned remains within a finished semiconductor device formed on the substrate 1. The processed layer 3 can also be a layer which once patterned is used in the patterning or formation of a device layer. For example, the processed layer 3 may be a masking layer (e.g., hard mask layer) used to pattern another film layer.

As an example, the first mask layer 4 is a bottom anti-reflective coating (BARC) film, and functions as an anti-reflective film when the resist layer 5 is exposed in an optical lithography process. In the present embodiment, the first mask layer 4 is an organic film formed by using a spin-coating method with a thickness of 60 nm.

A first opening portion H₁, a second opening portion H₂, and a third opening portion H₃ are formed in the resist layer 5 using lithography processing (see FIG. 1B). The lithography processing uses, for example, an ArF (argon-fluoride) immersion lithography exposure apparatus. The first opening portion H₁ is an example of a first concave portion, and the second and third opening portions H₂ and H₃ are each examples of a second concave portion. In addition, the first, second, and third opening portions H₁, H₂, and H₃ are respectively examples of first, second, and third concave portions.

FIG. 1B illustrates a width W₁ of the first opening portion H₁ in the X direction, a width W₂ of the second opening portion H₂ in the X direction, and a width W₃ of the third opening portion H₃ in the X direction. The width W₁ is, for example, 110 nm. The width W₂ is set to be longer than the width W₁ and is, for example, 170 nm. The width W₃ is set to be longer than the width W₂ and ism for example, 1 μm. The width W₁ is an example of a first width. The width W₂ and the width W₃ are examples of a second width. In addition, the widths W₁, W₂, and W₃ are respectively examples of first, second, and third widths.

The first opening portion H₁ according to the present embodiment is a hole pattern corresponding to a portion of a memory cell unit. Hence, the width W₁ denotes a diameter of the first opening portion H₁. The second opening portion H₂ according to the present embodiment is a hole pattern corresponding to a portion of a peripheral circuit unit. Hence the width W₂ denotes a diameter of the second opening portion H₂. The third opening portion H₃ according to the present embodiment is a groove pattern corresponding to a portion of an alignment mark (for performing subsequent lithography steps or the like) extending in the Y direction. Hence, the width W₃ denotes a line width of the third opening portion H₃.

Subsequently, a second mask layer 6 is formed on the entire surface of the substrate 1 (FIG. 2A). As a result, the second mask layer 6 is formed in the first, second, and third opening portions H₁, H₂, and H₃. The second mask layer 6 is an example of a third film.

The second mask layer 6 according to the present embodiment is an inorganic film such as a silicon oxide film formed by atomic layer deposition (ALD) or the like. The thickness of the second mask layer 6 according to the present embodiment is 20 nm. The second mask layer 6 according to the present embodiment is conformally formed on the entire surface of the substrate 1. As a result, the second mask layer 6 is formed on the side surfaces and the bottom surfaces of the first, second, and third opening portions H₁, H₂, and H₃.

Subsequently, a polymer film 7 is formed on portions of the second mask layer 6 in the first, second, and third opening portions H₁, H₂, and H₃ by spin-coating of a liquid containing the polymer of polymer film 7 (FIG. 2B). The polymer according to the present embodiment is a BCP, such as polystyrene-b-polymethylmethacrylate (PS-b-PMMA), and thus, the polymer film 7 according to the present embodiment is a BCP film. The polymer film 7 is an example of a fourth film.

FIG. 2B illustrates a minimum film thickness T₁ of the polymer film 7 in the first opening portion H₁, a minimum film thickness T₂ of the polymer film 7 in the second opening portion H₂, and a minimum film thickness T₃ of the polymer film 7 in the third opening portion H₃. The minimum film thickness T₁ is an example of a first minimum film thickness, and the minimum film thicknesses T₂ and T₃ are examples of a second minimum film thickness. In addition, the minimum film thicknesses T₁, T₂, and T₃ are respectively examples of the first, second, and third minimum film thicknesses.

A surface of the polymer film 7 in the first opening portion H₁ has a concave shape in general. Hence, the minimum film thickness T₁ corresponds to a thickness of the central portion of the polymer film 7 in the first opening portion H₁. This is also applicable to the minimum film thicknesses T₂ and T₃, in the same manner as above. In the present embodiment, the width W₂ is greater than the width W₁ and the width W₃ is greater than the width W₂, and thus, the minimum film thickness T₂ will generally be smaller than the minimum film thickness T₁, and the minimum film thickness T₃ will generally be smaller than the minimum film thickness T₂ over the relevant feature size ranges.

FIG. 8 is a schematic diagram illustrating a molecular structure of a BCP material used in the first embodiment.

BCP material according to the present embodiment is composed of a polymethylmethacrylate (PMMA) block B₁ containing multiple monomers M₁ (methylmethacrylate units), and a polystyrene (PS) block B₂ containing multiple monomers M₂ (styrene units). The PMMA block B₁ is an example of a first portion and an example of a first polymer block. The PS block B₂ is an example of a second portion and an example of a second polymer block.

In the present embodiment, a ratio of molecules in the PMMA block B₁ and the PS block B₂ is set such that a predetermined cylindrical phase is formed in the BCP film. Specifically, the ratio is set such that a cylindrical phase with a diameter of 20 nm is formed in the BCP film of the first opening portion H₁ by the PMMA block B₁.

Hereinafter, a pattern forming method according to the present embodiment will be described with reference to FIG. 3A to FIG. 7B.

After deposition of the polymer film 7, annealing is performed, and the PMMA block B₁ and the PS block B₂ phase separate (FIG. 3A). In doing so, a first pattern 7 a containing the PMMA block B₁ and a second pattern 7 b containing the PS block B₂ are formed in the polymer film 7. For example, the above-described annealing is performed for one minute at 250° C. in nitrogen (N₂) atmosphere. In the present embodiment, a columnar pattern which is called a cylindrical phase is formed as the first pattern 7 a. Here, the first opening portion H₁ functions as a guide for adjusting a position or a shape of the first pattern 7 a.

In the present embodiment, the phase separation of the polymer film 7 occurs in the first opening portion H₁ and only one first pattern 7 a is formed in the polymer film 7 disposed in the first opening portion H₁. The reason is that the width W₁ of the first opening portion H₁ is set such that phase separation occurs in the first opening portion H₁ and only one first pattern 7 a is formed in the first opening portion H₁. The first pattern 7 a in the first opening portion H₁ is formed in the central portion of the first opening portion H₁.

In addition, in the present embodiment, phase separation of the polymer film 7 does not occur in the second opening portion H₂, and a first pattern 7 a is not formed in the polymer film 7 disposed in the second opening portion H₂. The reason is that the width W₂ of the second opening portion H₂ is different from the width W₁ of the first opening portion H₁ and set such that phase separation of polymer film 7 does not easily occur.

In addition, in the present embodiment, phase separation of the polymer film 7 occurs in the third opening portion H₃, and multiple first patterns 7 a are formed in the polymer film 7 disposed in the third opening portion H₃. The reason is that the width W₃ of the third opening portion H₃ is large, and thus, the PMMA block B₁ and the PS block B₂ easily and freely move within the polymer film 7 to allow phase segregation. The first pattern 7 a in the third opening portion H₃ is formed in the peripheral portion of the third opening portion H₃.

In some embodiments, one or multiple first patterns 7 a may be formed in the second opening portion H₂. In addition, in some embodiments, only one first pattern 7 a may be formed in the third opening portion H₃, and in other embodiments the first pattern 7 a may not be formed in the third opening portion H₃ at all.

FIGS. 9A and 9B are perspective views illustrating examples of the first pattern 7 a in the third opening portion H₃ according to the first embodiment.

FIG. 9A illustrates a first example of the first patterns 7 a in the third opening portion H₃. In the first example, the first patterns 7 a extend in parallel in the Z direction.

FIG. 9B illustrates a second example of the first patterns 7 a in the third opening portion H₃. In the second example, the first patterns 7 a vertically extend in the Z direction.

The first patterns 7 a in the first opening portion H₁ are formed so as to extend in parallel in the Z direction in the same manner as in the first example (depicted in FIG. 9A).

Hereinafter, a pattern forming method according to the present embodiment will be continuously described with reference to FIG. 3B to FIG. 7B.

Subsequently, the first pattern 7 a is selectively removed, leaving the second pattern 7 b behind (FIG. 3B). By doing so, one opening portion P₁ is formed in the polymer film 7 of the first opening portion H₁, and multiple opening portions P₃ are formed in the polymer film 7 of the third opening portion H₃. The opening portion P₁ according to the present embodiment is a hole pattern with a diameter of 20 nm. For example, the selective removal of the first patterns 7 a is performed by irradiating the polymer film 7 with vacuum-ultraviolet (VUV) light which cause chain scissions in the PMMA block B₁, which lowers the molecular weight of the PMMA material and breaks linkages to the PS Block B₂, which allows the thusly degraded PMMA material to be dissolved using isopropyl alcohol (IPA) as a solvent (developer).

Subsequently, remaining portions of the polymer film 7 still in underneath the opening portions P₁ and P₃ can be removed by using a reactive ion etching (RIE) method (FIG. 4A). By doing so, the second mask layer 6 is exposed within the opening portions P₁ and P₃. The RIE method does not just remove the remaining portions of polymer film 7 underneath the openings P₁ and P₃, but rather acts to reduce the overall thickness of all remaining portions of the polymer film 7 in an approximately uniform manner. At this time, because the thickness of the polymer film 7 of the third opening portion H₃ is smaller in the central portion than in the peripheral portion an opening portion P₃ may also formed in the central portion of the polymer film 7 disposed in the third opening portion H₃.

Subsequently, etching is performed by using the remaining portions of polymer film 7 (second pattern 7 b) as a mask, and thereby the second mask layer 6 in the bottom portion of the opening portions P₁ and P₃ is removed (FIG. 4B). As a result, the opening portions P₁ and P₃ are transferred to the second mask layer 6, and the first mask layer 4 is exposed in the opening portions P₁ and P₃.

Subsequently, etching is performed by using at least one of the remaining portions of the polymer film 7 and the second mask layer 6 as a mask, and thereby the first mask layer 4 in the bottom portion of the opening portions P₁ and P₃ is removed (FIG. 5A). As a result, the opening portions P₁ and P₃ are transferred to the first mask layer 4, and the processed layer 3 is exposed in the opening portions P₁ and P₃. Since both the first mask layer 4 and the polymer film 7 are organic films, at least portions of polymer film 7 will also be removed during etching of the first mask layer 4.

The opening portion P₁ is thus made to pass through the second mask layer 6 in the first opening portion H₁ and the first mask layer 4 under the first opening portion H₁. In the same manner, the multiple opening portions P₃ are made to pass through the second mask layer 6 in the first opening portion H₁ and the first mask layer 4 under the first opening portion H₁. Meanwhile, an opening portion is not formed in the second mask layer 6 in the second opening portion H₂ nor in the first mask layer 4 under the second opening portion H₂.

Subsequently, an organic film 8 is formed on the substrate 1 by using mixed gas in which methane (CH₄) gas is mixed with tetrafluoromethane (CF₄) gas (FIG. 5B). The organic film 8 according to the present embodiment is a fluorocarbon film formed by generating plasma at a low bias using the mixed gas. Furthermore, the organic film 8 may contain hydrogen. The organic film 8 can be formed in an etching chamber in which the etching of FIG. 4B and FIG. 5A is performed. The organic film 8 is an example of a fifth film.

The organic film 8 according to the present embodiment is formed on the exposed portions of the processed layer 3 (in opening portion H₃), the first mask layer 4, the resist layer 5, and the second mask layer 6. The formation of organic film 8 is performed so as to cover the first opening portion H₁, and so as not to cover the second and third opening portions H₂ and H₃. An arrow A₁ denotes a state in which end portions of the organic film 8 come into contact with each other on the first opening portion H₁, and an opening end (upper end) of the first opening portion H₁ is covered by the organic film 8. Arrows A₂ and A₃ denote a state in which end portions (upper ends) of the second and third opening portions H₂ and H₃ are not covered by the organic film 8. The organic film 8 includes a portion 8 a which is formed on a surface of the first mask layer 4, the resist layer 5, or the second mask layer 6, and a portion 8 b which is formed on an exposed surface of the processed layer 3.

In the present embodiment, the width W₁ of the first opening portion H₁ is set to be smaller than the width W₂ of the second opening portion H₂ or the width W₃ of the third opening portion H₃. For this reason, the first opening portion H₁ is covered before the second and third opening portions H₂ and H₃ are covered. Hence, in the present embodiment, the organic film 8 is continuously deposited until the first opening portion H₁ is covered, and deposition of the organic film 8 is completed before the second and third opening portions H₂ and H₃ are covered.

The organic film 8 may be formed by using only methane (CH₄) gas in some embodiments. In this case, the organic film 8 is contains carbon and does not contain fluorine. Furthermore, the organic film 8 may further contain hydrogen.

Subsequently, the organic film 8 is isotropically etched by using oxygen (O₂) gas (FIG. 6A). As a result, the organic film 8 in the second opening portion H₂ is removed, and the second mask layer 6 in the second opening portion H₂ is exposed.

Since the first opening portion H₁ is covered, oxygen ions or oxygen radicals hardly reach the organic film 8 in the first opening portion H₁. Meanwhile, since the second opening portion H₂ is not covered, oxygen ions or oxygen radicals easily reach the organic film 8 in the second opening portion H₂. Hence, in a state in which the first opening portion H₁ is covered by the organic film 8, it is possible to expose the second mask layer 6 within the second opening portion H₂. At this time, the portion 8 b of the organic film 8 in the third opening portion H₃ may remain or may not remain depending on relative size of the openings and particular deposition and etching parameters used in the processing.

The second mask layer 6 according to the present embodiment is an inorganic film. For this reason, the second mask layer 6 in the second opening portion H₂ functions as an etching stopper (etch stop layer) when the organic film 8 in the second opening portion H₂ is etched. Hence, in the present embodiment, the size (width) of the second opening portion H₂ in a horizontal direction can be accurately controlled by the second mask layer 6.

Subsequently, the second mask layer 6 on the bottom surface of the second opening portion H₂ is removed by a RIE method, using the organic film 8 as a mask (FIG. 6B). As a result, the first mask layer 4 is exposed on the bottom surface of the second opening portion H₂. At this time, the second mask layer 6 remaining on the bottom surface of the third opening portion H₃ is also removed.

Subsequently, the first mask layer 4 under the second opening portion H₂ is removed by a RIE method, using the organic film 8 as a mask (FIG. 7A). As a result, the processed layer 3 becomes exposed under the second opening portion H₂. At this time, the first mask layer 4 remaining on the bottom surface of the third opening portion H₃ is also removed.

Since both the first mask layer 4 and the organic film 8 are organic films, the organic film 8 is also etched during etching of the first mask layer 4. Hence, in the etching of FIG. 7A, if the organic film 8 is removed, the underlying resist layer 5 or the second mask layer 6 functions as a mask thereafter.

In FIG. 7A, over-etching is performed until the organic film 8 of the first opening portion H₁ and/or the third opening portion H₃ is completely removed. At this time, the second mask layer 6 remains on the bottom surface of the first opening portion H₁, and thus, it is possible to prevent the opening portion P₁ from being expanded laterally.

The second mask layer 6 in the second opening portion H₂ and the first mask layer 4 under the second opening portion H₂ are removed, and the processed layer 3 is exposed under the second opening portion H₂. FIG. 7A illustrates the opening portion P₂ which passes through the second mask layer 6 in the second opening portion H₂ and the first mask layer 4 under the second opening portion H₂. In the same manner, the second mask layer 6 remaining in the third opening portion H₃ and the first mask layer 4 remaining under the third opening portion H₃ are removed, and the processed layer 3 is fully exposed under the third opening portion H₃. Meanwhile, the processed layer 3 is already exposed in advance in the opening portion P₁ under the first opening portion H₁.

Subsequently, the processed layer 3 is processed by using a RIE method, using at least one of the first mask layer 4, the resist layer 5, and the second mask layer 6 as a mask (FIG. 7B). As a result, first, second, and third opening portions R₁, R₂, and R₃ are respectively formed in the processed layers 3 under the first, second, and third opening portions H₁, H₂, and H₃. The second mask layer 6 is removed by the RIE method. Thereafter, the first mask layer 4 and the resist layer 5 are removed by ashing or the like.

FIG. 7B illustrates a width L₁ of the first opening portion R₁ in the X direction, the width L₂ of the second opening portion R₂ in the X direction, and the width L₃ of the third opening portion R₃ in the X direction. The first opening portion R₁ according to the present embodiment is a hole pattern in a memory cell portion, and the width (diameter) L₁ is 20 nm. The second opening portion R₂ according to the present embodiment is a hole pattern in a periphery circuit portion, and the width (diameter) L₂ is 100 nm. The width L₂ is greater than the width L₁. The third opening portion R₃ according to the present embodiment is a groove pattern for an alignment mark extending in the Y direction, and the width (line width) L₃ is 1 μm. The width L₃ is greater than the width L₂.

Thereafter, a metal material is buried in the first, second, and third opening portions R₁, R₂, and R₃. By doing so, contact plugs are formed in the first and second opening portions R₁ and R₂, and an alignment mark is formed in the third opening portion R₃.

As described above, in the present embodiment, the first mask layer 4 under the first opening portion H₁ is processed by using the polymer film 7 as a mask, and the first mask layer 4 under the second and third opening portions H₂ and H₃ is processed by using the organic film 8 as a mask. Hence, according to the present embodiment, lithography is simply performed once when the first to third opening portions H₁ to H₃ are formed (refer to FIG. 1B), and thus, it is possible to form the first to third opening portions R₁ to R₃ having desired sizes in the processed layer 3.

In the present embodiment, by using the organic film 8 as a mask, it is possible to prevent lithography from having to be performed twice or more. For example, if the lithography is performed after etching, the substrate 1 would have to be moved from an etching chamber to an exposure machine (e.g., stepper). However, the organic film 8 according to the present embodiment can be formed in an etching chamber, as described with reference to FIG. 5B. Hence, according to the present embodiment, it is possible to simplify fabrication processes of a semiconductor device, compared to a case in which lithography would be performed twice or more.

In the present embodiment, the polymer film 7 is used as a mask, and thus, it is possible to form the first opening portion R₁ with the width L₁ smaller than the width W₁ of the first opening portion H₁, and to form fine patterns. According to the present embodiment, it is possible to form the fine patterns by performing the lithography once in common with other patterns.

As described above, according to the present embodiment, it is possible to efficiently form multiple patterns with sizes different from each other.

The first and second opening portions R₁ and R₂ may be concave portions other than contact holes. As an example, the concave portion can be a space portion in a line and space (L/S) pattern. In the same manner, the third opening portion R₃ may be a concave portion other than a groove for an alignment mark.

In addition, the polymer of the polymer film 7 may be BCP material other than PS-b-PMMA. In addition, the second mask layer 6 may be an inorganic film other than a silicon oxide film. In addition, the resist layer 5 may be replaced with a mask layer other than a resist layer. For example, the resist layer 5 may be replaced with a spin-on-carbon (SOC) film, or a laminating film which includes the SOC film and a silicon oxide film.

While certain embodiments have been described, these embodiments have been presented by way of example only, and are not intended to limit the scope of the inventions. Indeed, the novel embodiments described herein may be embodied in a variety of other forms; furthermore, various omissions, substitutions and changes in the form of the embodiments described herein may be made without departing from the spirit of the inventions. The accompanying claims and their equivalents are intended to cover such forms or modifications as would fall within the scope and spirit of the inventions. 

What is claimed:
 1. A pattern forming method, comprising: forming a first film on a first layer; forming a second film on the first film; forming a first concave portion having a first width in the second film and a second concave portion having a second width greater than the first width in the second film; forming a third film in the first and second concave portions, the third film being a conformal film; forming a fourth film on the third film in the first and second concave portions, the fourth film comprising a polymer with a first portion and a second portion that are phase-separable from each other; processing the fourth film to phase separate that first and second portions of the polymer to form a first pattern region in the fourth film in which the first portion predominates and a second pattern region in the fourth film in which the second portion predominates; removing at least a portion of the first pattern region; patterning the third film in the first concave portion using the second pattern region in the fourth film as a patterning mask; patterning the first film under the first concave portion using at least one of the second pattern region and the third film as a patterning mask; forming a fifth film on the first, second, and third films, the fifth film closing an opening above the first concave portion and while leaving at least a portion of an opening above the second concave portion unclosed; patterning the third film in the second concave portion and the first film under the second concave portion using the fifth film as a patterning mask; and patterning the first layer using at least one of the patterned first, second, and third films as a patterning mask.
 2. The method according to claim 1, wherein the first and second pattern regions form in the first concave portion and not in the second concave portion.
 3. The method according to claim 1, wherein first and second pattern regions of the polymer form in the first and second concave portions.
 4. The method according to claim 1, wherein the fourth film is formed so as to have a first minimum film thickness in the first concave portion, and to have a second minimum film thickness in the second concave portion, the first minimum film thickness being greater than the second minimum film thickness.
 5. The method according to claim 1, wherein the polymer is a block copolymer having a first polymer block as the first portion and a second polymer block as the second portion.
 6. The method according to claim 1, wherein the polymer is a block copolymer formed of styrene monomer units and methylmethacrylate monomer units.
 7. The method according to claim 1, wherein the fifth film comprises carbon atoms.
 8. The method according to claim 7, wherein the fifth film is a fluorocarbon film.
 9. The method according to claim 1, wherein removing at least a portion of the first pattern region comprises exposing the polymer to vacuum-ultraviolet light and then a solvent.
 10. The method according to claim 1, wherein forming the fourth film on the third film includes spin coating the polymer from a liquid solution.
 11. The method according to claim 1, wherein forming the first concave portion and the second concave portion comprises a photolithographic patterning of a photoresist film disposed on the second film.
 12. A pattern forming method, comprising: forming a first layer on a substrate; forming a first film on the first layer; forming a second film on the first film; forming a first concave portion having a first width in the second film, a second concave portion having a second width greater than the first width in the second film, and a third concave portion having a third width greater than the second width in the second film; forming a third film in the first, second, and third concave portions, the third film being a conformal film; forming a fourth film on the third film in the first, second, and third concave portion, the fourth film comprising a polymer with a first portion and a second portion that are phase-separable from each other; processing the fourth film to phase separate that first and second portions of the polymer to form a first pattern region in the fourth film in which the first portion predominates and a second pattern region in the fourth film in which the second portion predominates; removing at least a portion of the first pattern region; patterning the third film in the first concave portion using the second pattern region as a patterning mask; patterning the first film under the first concave portion using at least one of the second pattern region and the third film as a patterning mask; forming a fifth film on the first, second, and third films, the fifth film closing an opening above the first concave portion while leaving at least a portion of the an opening above each of the second and third concave portions unclosed; patterning the third film in the second and third concave portions and the first film under the second and third concave portions using the fifth film as a patterning mask; and patterning the first layer using at least one of the patterned first, second, and third films as a patterning mask.
 13. The method according to claim 12, wherein the first and second pattern regions form in the first and third concave portions and not in the second concave portion.
 14. The method according to claim 12, wherein the fourth film is formed so as to have a first minimum film thickness in the first concave portion, a second minimum film thickness in the second concave portion, and a third minimum film thickness in the third concave portion, the second minimum film thickness being less than the first minimum film thickness, and the third minimum film thickness being less than the second minimum film thickness.
 15. The method according to claim 12, wherein the polymer is a block copolymer formed of styrene monomer units and methylmethacrylate monomer units.
 16. The method according to claim 12, wherein the fifth film is a fluorocarbon film.
 17. The method according to claim 12, wherein removing at least a portion of the first pattern region comprises exposing the polymer to vacuum-ultraviolet light and then a solvent.
 18. The method according to claim 12, wherein forming the fourth film on the third film includes spin coating the polymer from a liquid solution.
 19. A method of patterning, comprising: patterning a first mask layer disposed on a first layer and forming a first opening, a second opening, and a third opening through the first mask layer, the first opening having a first width, the second opening having a second width greater than the first width, and the third opening having a third width greater than the second width; forming a conformal film on the patterned first mask layer and the first layer exposed by the openings; after forming the conformal film, depositing a polymeric material on conformal film to at least partially fill the first opening to a first thickness, the second opening to a second thickness less than the first thickness, and the third opening to a third thickness less than the second thickness, wherein composition of the polymeric material, the first width, the second width, and the third width are selected such that the polymeric material deposited in the first opening phase segregates into a pattern of distinct compositional phases and the polymeric material in the second opening does not phase segregate into a pattern of distinct compositional phases; removing a portion of a first compositional phase in the pattern of distinct compositional phases formed by the polymeric material in the first opening; transferring at least a portion of the pattern of distinct compositional phases into the conformal film and the first film at a position corresponding to the removed portion of the first compositional phase by etch processing; forming an organic film over the remaining portions of the conformal film and the first film; patterning the first layer by removing portions of the first layer corresponding to positions of the second opening and the third opening; and transferring a pattern into a second layer below the first layer by removing portions of the second layer corresponding in position to the first compositional phase in the pattern of distinct compositional phases formed by the polymeric material in the first opening, a position of the second opening, and a position of the third opening.
 20. The method of claim 19, wherein the polymer is a block copolymer of styrene and methylmethacrylate monomer units. 